Thin Film Deposition
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Beschreibung |
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AJA sputter chamber
- 5 confocal sputter guns
- 1 face-to-face sputter gun
- 2 rf sources possible
- max. substrate size 3" with substrate rotation
- high vacuum
Responsible: T. Naumann(1)
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Bestec sputter chamber
- 8 sputter guns, face-to-face&confocal
- 2 RF sources
- Ion source
- max. sample size 4" (100 mm)
- substrate rotation up to 36 rpm
- temperature range: RT - 1200 K
- ultrahigh vacuum
Responsible: T. Naumann(2)
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ALDI: apparatus for layer deposition and interfaces
- Manufacturer: Createc
- MBE:
- 5 pocket e-beam evaporator
- 4 Knudsen cells
- EFM3 evaporator
- Ion source: Model Kremer IQ100
- Plasma source
- LEED
- AES
- sample size 10 x 10 mm²
Responsible: K. Potzger(3)
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Sputnik: sputter chamber
- sample size 10 x 10 mm²
- temperature range: RT - 1000 °C
- 2 targets
- base pressure 1e-10 mbar
- sputter pressure 3e-3 mbar at 43 sccm Argon
Responsible: K. Potzger(4)
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