The Rossendorf Ion Beam Analysis Laboratory - Overview

At the Institute for Ion Beam Physics and Materials Research three MeV accelerators are used for ion beam analysis  with state-of-the-art experimental setups.
The general layout shows the arrangment of the accelerators, beam lines and target positions in the laboratory.

Ionenstrahlzentrum 2006


The  accelerators

2 MV van de Graaff accelerator

The single stage 2 MV van de Graaff accelerator provides p, d, and He ions and is mostly used for RBS/channeling, but also for NRA and He-ERDA.
Built by: Transformatoren- und Röntgenwerk Dresden/Germany 
Start of operation: 1963 
Terminal voltage: 0.3 - 1.7 MV 
Beam current: 0.01 - 1.0 µA 
Kinds of ions: 1H, 2H, 4He 
Ion source: rf ion source 

3 MV  Tandetron

The 3 MV  Tandetron is used both as high current MeV implanter and  for various  ion beam analytical  work. A sputter ion source provides a wide variety of negative ions and the  RF source with a lithium vapour charge exchange cell delivers a He beam  with currents up to a few hundred nA,  sufficient for RBS measurements. Three beamlines with dedicated experimental facilities follow a first switching magnet. A forth beamline is directed to an adjacent hall, where a second switching magnet distributes the beam to additional experimental facilities.
Built by: High Voltage Engineering Europa Amersfoort/ Netherlands 
Start of operation: 1993 
Terminal voltage: 0.1 - 3.3 MV 
Beam current: 0.001 - 200 µA 
Kinds of ions: nearly all kinds of ions including He ions 
Ion sources: Cs sputter ion source IONEX 860-C. 

5 MV Tandem accelerator

The vertical  5 MV Tandem accelerator is  mainly employed  for  ion beam analysis and to a lesser extend  for high energy ion implantation. Three ion sources, a sputter source, a duoplasmatron and a He ion source  are available, but provisions are made for the permanent  installation of two other types of sources. Ten  beam-lines in  two spacious experimental halls offer wide possibilities for the installation of  various experiments. Seven of them are eqipped with  facilities for material research, two are used for ion implantation or  irradiation.
Built by: Efremov Institute NIIEFA St. Petersburg/ Russia 
Start of operation: 1972 
Terminal voltage: 0.8 - 4.5 MV 
Beam current: 0.001 - 10 µA 
Kinds of ions: nearly all kinds of ions except noble gas ions, 
mainly 1H, 2H, Li, C, 14N, 15N, O, Cl, Br 
Ion sources: Cs sputter ion source MISS-483, off-axis duoplasmatron EKTON-4