Dr. Stefan Facsko
Head Ion Induced Nanostructures
Phone: +49 351 260 - 2987
Fax: 12987, 2879

Highly Charged Ions Facilities

Two-source facility


Two-source-Facility for Experiments with Highly Charged Ions

The two-source facility for highly charged ions (HCI) ate Helmholtz-Zentrum Dresden-Rossendorf is a unique combination of an electron cyclotron resonance (ECR) ion source with a room temperature electron beam ion source, the Dresden EBIT/EBIS. The beams of both ion sources are directed into a common UHV target chamber and can be used there for experiments and irradiations with slow highly charged . The ion species, charge states, kinetic energies, and ion fluxes differ strongly for the ECR and EBIT sources due to their different ionization mechanisms. Therefore, a broad spectrum of highly charged ions is available for experiments. In order to keep the target chamber and the experiment on ground potential and to decelerate the ions to kinetic energies lower than q*20 eV (q=charge state) the beamline is on negative potential (-25 keV). The focus of the current investigations is the interaction of highly charged ions with solid surfaces, especially the formation of nanostructures induced by the deposition of the potential energy into the surface of crystalline materials.

Two-source facility
Two-source facility for experiments with highly charged ions: EBIT/EBIS (right), ECR ion source (middle, light blue) und UHV target chamber on ground potential (left).