Contact

Dr. Roman Böttger
Head Ion Implantation
Ion Technology
r.boettger@hzdr.de
Phone: +49 351 260 - 2873

PBII-3

PBII-3

 

   Applications

   Implantation using ultra-clean gases, e.g. for biomedical applications,

   Generation of nanostructured stainless steel surfacesI,

   Passivation of NiTi

   Chamber

   Stainless steel, UHV, cooling and heating possible

   Plasma generation

   RF antenna

   Substrate size

   max. 70 mm x 70 mm x 50 mm

   Substrate holder

   fixed, no cooling, no heating

   Voltage

   0.1 - 40 kV

   Standard gases

   Ar, N2, O2, H2

   Other species

   on request


Contact

Dr. Roman Böttger
Head Ion Implantation
Ion Technology
r.boettger@hzdr.de
Phone: +49 351 260 - 2873