PBII-5

PBII-5 Metall-PBII

 

Applications

Implantation from gas and metal plasmas; magnetron sputtering deposition in conjunction with implantation possible

Hardening of stainless steel,

Ion Nitriding of Aluminium and Aluminium Alloys,

Low Temperature TiN Deposition

Chamber

Stainless steel, cooling possible

Plasma generation

RF antenna, magnetrons

Substrate size

max. Ø 200 mm x 200 mm

Substrate holder

fixed, no cooling, no heating

High voltage

0.1 - 40 kV

Standard gases

Ar, N2, O2, H2

Other species

Cr, Cu, Ni, Ti, Ta, Ag, C, others on request


Contact

Dr. Roman Böttger
Head Ion Implantation
Ion Technology
r.boettger@hzdr.de
Phone: +49 351 260 - 2873