Contact

Dr. Roman Böttger
Head Ion Implantation
Ion Technology
r.boettger@hzdr.de
Phone: +49 351 260 - 2873

PBII-7

PBII 7_1 TiAl Komponenten

   Applications

   Implantation of halogens

   Efficient oxidation protection of Ti and TiAl alloys by plasma immersion ion implantation of halogens

   Chamber

   Stainless steel, cooling possible, Al liner

   Plasma generation

   RF antenna

   Substrate size

   max. Ø 150 mm x 150 mm

   Substrate holder

   fixed, no cooling, no heating

   High voltage

   0.1 - 40 kV

   Standard gases

   Ar, N2, O2, H2, CH2F2

   Other species

   no


Contact

Dr. Roman Böttger
Head Ion Implantation
Ion Technology
r.boettger@hzdr.de
Phone: +49 351 260 - 2873