Contact

Dr. Roman Böttger
Head Ion Implantation
Ion Technology
r.boettger@hzdr.de
Phone: +49 351 260 - 2873

PBII-8

PBII-8 PBII-Edelstahlkammer

   Applications

   Implantation from gas and metal plasmas

   Magnetron sputtering deposition in conjunction with implantation possible

   Chamber

   Stainless steel

   Plasma generation

   RF antenna, magnetrons

   Substrate size

   maximum 200 mm x 200 mm x 200 mm

   Substrate holder

   Turnable (30 rpm), vertically adjustable up to 250 mm, water cooled, no heatingg

   High voltage

   0.1 - 20 kV

   Standard gases

   Ar, N2, O2, H2

   Other species

   Cr, Cu, Ni, Ti, Ta, Ag, C and on request


Contact

Dr. Roman Böttger
Head Ion Implantation
Ion Technology
r.boettger@hzdr.de
Phone: +49 351 260 - 2873