PBII-9
Supplier |
Dresden Thin Film GmbH |
Applications |
Implantation, doping of semiconductors |
Chamber |
Aluminium |
Plasma generation |
RF antenna system |
Substrate size |
max. Ø 300 mm x 10 mm |
Substrate holder |
Turnable (30 rpm), vertically adjustable up to 250 mm, water cooled |
Voltage |
0.1 - 20 kV |
Standard gases |
Ar, N2, H2, PH3, NF3 |
Other species |
no |