Contact

Dr. Roman Böttger
Head Ion Implantation
Ion Technology
r.boettger@hzdr.de
Phone: +49 351 260 - 2873

PBII-9

PBII 9-4 PBII 9-3

 

   Supplier

Dresden Thin Film GmbH

   Applications

Implantation, doping of semiconductors

   Chamber

Aluminium

   Plasma generation

RF antenna system

   Substrate size

max. Ø 300 mm x 10 mm

   Substrate holder

Turnable (30 rpm), vertically adjustable up to 250 mm, water cooled

   Voltage

0.1 - 20 kV

   Standard gases

Ar, N2, H2, PH3, NF3

   Other species

no


Contact

Dr. Roman Böttger
Head Ion Implantation
Ion Technology
r.boettger@hzdr.de
Phone: +49 351 260 - 2873