Contact

Prof. Dr. Andreas Kolitsch
HZDR Innovation GmbH
a.kolitschAthzdr.de
Phone: +49 351 260 - 3348
Fax: 13348, 2703

40 kV Low Energy Ion Implanter

  • Supplier:
DANFYSIK 1050
  • Ion source:
CHORDIS, Gas- und Feststoffbetrieb
  • Energy range (+):
500 eV to 40 keV (< 3keV in deceleration mode)
  • Scan principle:
twofold electrostatic

Chamber

LE-Implanter 1

  • Substrates:
Wafers or smaller probes
  • Substrate size:
1 cm2 to Ø 150 mm Wafer
  • Implant area:
maximal 150 mm x 150 mm
  • Implant angle (tilt):
0° and 7°, other angles on request
  • Substrate temperature:
no cooling, no heating
  • Dose range:
1e12 to 1e17 cm-2 (1e18 cm-2 on request)

Contact

Prof. Dr. Andreas Kolitsch
HZDR Innovation GmbH
a.kolitschAthzdr.de
Phone: +49 351 260 - 3348
Fax: 13348, 2703