Equipment for Plasma-Based Ion Implantation (PBII)

At the moment there are 6 PBII tools available. The plasma generation is possible with gaseous, liquid or solid source feeds.

Tool

Plasma generation

Chamber

Substrate size

High voltage

 Standard gases

 Other species

Application

PBII-3

RF antenna

Stainless steel, UHV

max. 70 mm x 7 0mm x 50 mm

0.1 - 40 kV

Ar, N2, O2, H2

on request

Implantation

PBII-5

RF antenna

Stainless steel

max. Ø 200 mm x 200 mm

0.1 - 40 kV

Ar, N2, O2, H2

Cr, Cu, Ni, Ti, Ta, Ag, C, others on request

Implantation and deposition

PBII-6

Magnetron

Stainless steel

max. Ø 75 mm x 20 mm

0.1 - 12 kV

Ar, N2, O2, H2

on request

Implantation

PBII-7

RF antenna

Stainless steel, Al liner

max. Ø 150 mm x 150 mm

0.1 - 40 kV

Ar, N2, CH2F2, SiF4

no

Implantation of F

PBII-8

RF antenna

Stainless steel

max. 200 mm x 200 mm x 200 mm

0.1 - 20 kV

Ar, N2, O2, H2

on request

Implantation and deposition

PBII-9

RF antenna

Aluminium

max. Ø 300 mm x 10 mm

 

0.1 - 20 kV

Ar, N2, H2, PH3, NF3

no

Doping of semiconductors


Contact

Dr. Roman Böttger
Head Ion Implantation
Ion Technology
r.boettger@hzdr.de
Phone: +49 351 260 - 2873