Contact

PD Dr. habil. Artur Erbe
Abteilungsleiter
Scaling Phenomena
a.erbeAthzdr.de
Phone: +49 351 260 2366

Dr. Yordan Georgiev
Head of Nanofabrication
Transport Phenomena in Nanostructures
y.georgiev@hzdr.de
Phone: +49 351 260 2321

Equipment: Transport phenomena in nanostructures

Planned experimental setups

Machine Details
RAITH 150
Electron beam writer
RAITH 150 TWO
  • Manufacturer: RAITH
  • Applications:
    • Nanolithography
    • Imaging
  • Electron source:
    • 30 kV Schottky thermal field electron emitter ZrO/W
  • Sample size: samples of a few mm size up to 4 inch wafers
  • Smallest feature size: sub 8 nm
  • Sample stage with laser interferrometer
    • Resolution: 1nm
  • Height sensing and FBMS mode available
  • GDSII edidor for generation of complex structure design on several layers with individual dose factor assignment for single structrure elements
  • NanoPECSTM software suite for the correction of proximitty effects

Responsible: Dr. Y. Georgiev, Y.Georgiev@hzdr.de, 0351 / 260 - 2321

RAITH eLiNE
Electron beam writer
RAITH 150 eLiNE plus
  • Manufacturer: RAITH
  • Applications:
    • Nanolithography
    • Imaging
    • Nanoengineering
  • Electron source:
  • 30 kV Schottky thermal field electron emitter ZrO/W
  • Sample size: samples of a few mm size up to 3 inch wafers
  • Smallest feature size: sub 5 nm
  • Sample stage with laser interferrometer
    • Resolution: 1nm
  • 4 integrated nanomanipulators for e.g. nanoprobing
  • Height sensing mode available
  • GDSII edidor for generation of complex structure design on several layers with individual dose factor assignment for single structrure elements
  • NanoPECSTM software suite for the correction of proximitty effects

Responsible: Dr. Y. Georgiev, Y.Georgiev@hzdr.de, 0351 / 260 - 2321

RIBE IonSys 500
Reactive Ion Beam Etcher
IonSys 500
  • Manufacturer: Roth & Rau
  • Applications:
    • Anisotropic etching of:
      • Metals
      • Magnetic stacks
  • Sample size: samples of a few mm size up to 6 inch wafers
  • Ar source
  • Etch gas: CF4
  • Helium backside cooling
  • Sample tilting up to 90°
  • Sample rotation up to 10 rpm
  • End point detection

Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366>

Cryogenic Probe Station CPX-VF
Cryogenic Probe Station
CPX-VF
 
  • Manufacturer: LakeShore
  • Applications:
    • C-V measurements
    • I-V measurements
    • 4-Probe measurements
    • Hall measurements
    • Microwave measurements
    • Electro-optical measurements
    • all measurements can be combined with out-of-plane vertical field superconducting magnetic measurements
  • Sample size: samples of a few mm size up to 2 inch wafers
  • Magnetic field: ∓ 2,5 T
  • Orientation of the magnetic field: vertical out-of-plane
  • Temperature range: 4.5 K – 400 K
  • Available sample holder:
    • grounded sample holder
    • coaxial sample holder
    • tiltable sample holder
      • Orientation of the magnetic field can be changed to in-plane
  • Measuring devices:
    • AGILENT 4156C Precision Semiconductor Parameter Analyzer
    • LakeShore 625 Superconductiong magnet power supply
    • LakeShore 340 Temperature controller
    • LakeShore 332 Temperature controller
  • Incoupling of a laser signal (λ = 473nm / 785nm) possible
  • Multiple radiation shields for best low temperature performance
  • Minimize sample condensation during cool-down
  • True 90° probing

Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366>

Cryogenic Probe Station CPX
Cryogenic Probe Station
CPX-VF
  • Manufacturer: LakeShore
  • Applications:
    • C-V-measurements
    • I-V-measurements
    • Microwave-measurements
    • Electro-optical-measurements
  • Sample size: wafers up to 2 inch

Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366>

Cryogenic UHV break junction setup

  • Low-temperature MCBJs
    • C60 evaporator
    • UHV
    • Temperature range 4K – 400 K
  • Electrical characterization
    • MCBJ
    • C60

Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366

 

Mechanically controllable break junctions (MCBJ)

  • Room temperature
  • Liquid environment
  • Application
    • Electrical characterization of molecular structures in liquid environment

Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366

BETty

  • UHV evaporation tool
    • Base pressure <10-9 mbar
    • E-gun evaporator (7 pockets)
    • Thermal evaporator (Al)
    • Temperature range 130 K – 600 K
    • Tilt range ±45°
    • Sputter gun (sample cleaning)
  • Application: Metal film deposition

Responsible: Dr. Y. Georgiev, Y.Georgiev@hzdr.de, 0351 / 260 - 2321

Laser cutter

Plasma cleaner

High vacuum oven

Optical Tweezers

  • tool for ...
    • ...
  • Application: ...

Responsible: ...

Planned experimental setups

 

  • Cluster source
    • Deposition of MoS clusters
    • Mass separation
    • Electrical characterization using MCBJ
  • Application
    • Electrical characterization of mass-selected MoS clusters using mechanically controllable break junctions (MCBJs)

Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366

ASOPS

  • Application
    • Optical characterization of nanomechanical resonators

Responsible: Dr. A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366

To the top


Contact

PD Dr. habil. Artur Erbe
Abteilungsleiter
Scaling Phenomena
a.erbeAthzdr.de
Phone: +49 351 260 2366

Dr. Yordan Georgiev
Head of Nanofabrication
Transport Phenomena in Nanostructures
y.georgiev@hzdr.de
Phone: +49 351 260 2321