Physics of Ionized and Ion-Assisted PVD: Principles and Current Trends
June 26 - 28, 2013, Helmholtz-Zentrum Dresden-Rossendorf (26 - 27 June) and Fraunhofer-Institut für Werkstoff- und Strahltechnik IWS (28 June), Dresden, Germany
Ionized and ion-assisted physical vapor deposition (i(a)-PVD) technologies rely on the presence of energetic ions playing a key role in determining the growing film properties. Ions provide an amount of energy per material atom which is much larger than the energy provided by any other process. The directionality of ionized species is another important property which has aroused broad interest in i(a)-PVD techniques as it enables coating substrates with complex shapes such as vias or trenches or producing highly oriented films on amorphous substrates.
The goals of the seminar are to
- bring together experts in the field of ionized and ion-assisted physical vapor deposition techniques and young scientists to discuss the state-of-the-art, future developments as well as applications of energetic ions for film growth;
- provide an overview of the basics of ion-solid interactions and generation of highly ionized plasmas;
- introduce and extend on specific focus areas of the i(a)-PVD techniques such as: ion beam assisted deposition (IBAD), pulsed laser deposition (PLD), high power impulse magnetron sputtering (HiPIMS) and arc deposition;
- employ the experimental facilities at the HZ Dresden-Rossendorf and the Fraunhofer-Institut für Werkstoff- und Strahltechnik for laboratory demonstrations of all techniques.
Dr. Gintautas Abrasonis, Helmholtz-Zentrum Dresden-Rossendorf
Dr. Mykola Vinnichenko, Fraunhofer-Institut für Keramische Technologien und Systeme, IKTS Dresden
Prof. Dr. Sibylle Gemming, Helmholtz-Zentrum Dresden-Rossendorf
This seminar is funded by the Wilhelm and Else Heraeus Foundation.