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Paper Details


Bibliographic Data:


Code: PSWG84
Paper Type: Article
Author(s): Pulfer K, Schindler PW, Westall JC, Grauer R
Title: Kinetics and mechanism of dissolution of bayerite (g-Al(OH)3) in HNO3-HF solutions at 298.2 K
Journal: Journal of Colloid and Interface Science
Volume: 101   Year: 1984   Pages: 554-564
ISSN-Print: 0021-9797
Internal Storage: V1463
DOI: 10.1016/0021-9797(84)90067-5
Abstract:

The rate of dissolution of bayerite (γ-Al(OH)3) in HNO3-HF solutions of the constant ionic strength 1 M at 298.2°K is given by

R = S(k1[H+] + (k2C0K1s[H+]2[F]3e+) (1 + (Ka1s)−1[H+]e + Ka2s[H+]−1e+ + K1s[F]e+ + K2s[H+][F] + K3s[H+][F]2e+)−1)

where k1 = 1.5 (±0.3) × 10−7 dm3 sec−1 m−2; k2 = 1.11 (±0.1) × 1011 kg dm12 m−2 sec−1 mole−4; S = surface area (m2); C0 = total concentration of reactive surface groups (=2.66 × 10−2 mole kg−1). Ka1s, Ka2s, K1s, K2s, and K3s as defined are equilibrium constants related to the adsorption of H+ and F from the solution to the bayerite surface. Their numerical values were obtained from adsorption studies. The e+ = exp(/RT) and e = exp(-/RT) account for the acting surface potential ψ which was calculated from the surface charge assuming a Helmholtz-type double layer. The results are discussed in terms of the stoichiometry of the precursor of the activated complex and possible reaction mechanisms. It is concluded that the present knowledge on the mechanisms of dissolution reaction of oxides and hydroxides is limited by the present ignorance of the surface structure and the structure of the electrical double layer.


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