Nucleation Control for Large, Single Crystalline Domains of Monolayer Hexagonal Boron Nitride via Si-Doped Fe Catalysts
Nucleation Control for Large, Single Crystalline Domains of Monolayer Hexagonal Boron Nitride via Si-Doped Fe Catalysts
Caneva, S.; Weatherup, R. S.; Bayer, B. C.; Brennan, B.; Spencer, S. J.; Mingard, K.; Cabrero-Vilatela, A.; Baehtz, C.; Pollard, A. J.; Hofmann, S.
The scalable chemical vapor deposition of monolayer hexagonal boron nitride (h-BN) single crystals, with lateral dimensions of ∼0.3 mm, and of continuous h-BN monolayer films with large domain sizes (>25 μm) is demonstrated via an admixture of Si to Fe catalyst films. A simple thin-film Fe/SiO 2/Si catalyst system is used to show that controlled Si diffusion into the Fe catalyst allows exclusive nucleation of monolayer h-BN with very low nucleation densities upon exposure to undiluted borazine. Our systematic in situ and ex situ characterization of this catalyst system establishes a basis for further rational catalyst design for compound 2D materials.
Keywords: Hexagonal boron nitride (h-BN); chemical vapor deposition (CVD); borazine (HBNH)3; in situ X-ray diffraction (XRD); secondary ion mass spectrometry (SIMS); Fe catalyst
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Permalink: https://www.hzdr.de/publications/Publ-23207
Publ.-Id: 23207