Comparison of FIB Resolution for Different Ion Species in Imaging and Writing Mode


Comparison of FIB Resolution for Different Ion Species in Imaging and Writing Mode

Bischoff, L.; Pilz, W.; Hlawacek, G.; Mazarov, P.; Bauerdick, S.; Gierak, J.

Focused Ion Beam (FIB) processing, which is nearly exclusively based on gallium Liquid Metal Ion Sources (LMIS) [1] expands more and more to other ion species also by implementation of other types of ion sources. Many applications in nano-technology could benefit from ion species other than gallium, like local doping by ion implantation, ion beam mixing, ion beam synthesis [2], or direct milling using various ions [3]. The application of Gas Field Ion Sources (GFIS) opens the sub-nm range for ion microscopy in the case of He [4].
A key parameter of FIB applications is the spatial resolution in terms of full width at half maximum (FWHM) of the beam profile, which can be described by e.g. two Gaussian functions or a Holtsmark distribution. Three main parts contribute to the obtainable resolution: a source term containing the virtual source size and the magnification, the spherical aberration, describing geometrical effects and the chromatic aberration depending on the energy spread of the ion source [5]. All contents are influenced by the ion source itself as well as the performance of the ion optics. For an optimum image resolution another shape of the beam profile with a sharp tip should be chosen by a suited alignment than for surface patterning by ion milling where more parallel slopes of the distribution a preferred. For a minimum feature size the beam interaction with the surface as well as the combination of ion species and target material must be put into consideration.
In this contribution the beam resolution will be basic discussed for a broad spectrum of ions beginning for light species, Helium Ion Microscope (Fig. 1) and Be from an AuSiBe LMAIS in a mass separated FIB (Fig. 2) up to very heavy ones, like Au, Bi and polyatomic clusters from them. The obtainable FIB resolution in the image and the patterning mode will be compared and discussed.

[1] J. Gierak; Focused ion beam technology and ultimate applications, Sem. Sci. Technol. 24 (2009), 1.
[2] L. Bischoff, P. Mazarov, L. Bruchhaus and J. Gierak; Liquid metal alloy ion sources – An alternative for focused ion beam technology, Appl. Phys. Rev. 3 (2016), 021101.
[3] S. Bauerdick et al.; Multispecies focused ion beam lithography system and its applications, J. Vac. Sci. Technol. B 31 (2013), 06F404-1.
[4] G. Hlawacek, V. Veligura, R. van Gastel, and B. Poelsema; Helium ion microscopy, J. Vac. Sci. Technol. B 32 (2014), 020801-1.
[5] R.G. Forbes in Charged Particle Optics, ed. J. Orloff, CRC Press (2009).

Keywords: Focused ion beam; Liquid Metal Alloy Ion Source; Helium microscope

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