Sputtering in combination with flash lamp annealing for thin film deposition on glass


Sputtering in combination with flash lamp annealing for thin film deposition on glass

Rebohle, L.; Neubert, M.; Schumann, T.; Skorupa, W.

Flash lamp annealing (FLA) is an innovative annealing method already used in semiconductor industry, for flexible electronics and for thin, functional coatings on glass. Due to the short time scale of milliseconds, FLA is cost and time effective, suitable for temperature-sensible substrates and allows the exploitation of non-equilibrium processes. Recently, FLA was combined with atomic layer deposition to improve the properties and functionality of thin films by in-situ annealing.
In this contribution we present a new approach in which magnetron sputtering is combined with FLA. Whereas the first part covers technological aspects of this new approach, the second part reports on first experiments to fabricate thin films (e.g. polycrystalline silicon) on glass carriers and thin glass foils. The improvement of sputtered films by post-deposition treatment is a general issue in order to achieve the desired structural, optical and electrical properties. In detail, the functionalization process on the millisecond time scale and strategies to avoid thermal stress, to minimize defects and to obtain layers with a low electrical resistivity are discussed.

Keywords: Flash lamp annealing; magnetron sputtering; amorphes Silicon

  • Poster
    ICCG 12 – Conference on Coatings on Glass and Plastics, 11.-15.06.2018, Würzburg, Deutschland

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Publ.-Id: 27646