Master theses / Diploma theses

Various metals, semiconductors, and oxides form regular nanoscale surface patterns in a complex process of self-assembly under low energy ion irradiation. While the elemental semiconductors Si and Ge have been extensively studied in this respect, there is no such investigation for alloys of Si and Ge. We want to explore which nanoscale pattern morphologies can emerge on SiGe surfaces and how they can be modified via the conditions of ion irradiation. We expect to obtain new insights into the complex process of ion-induced nanopattern formation in technologically relevant materials.
This work comprises the preparation of nanopatterned surfaces by low energy ion irradiation, imaging these surfaces surfaces by atomic force microscopy and electron microscopy, the quantitative analysis of these data, as well as simulating the patterning process based on continuum equations or kinetic MonteCarlo models.
The project provides an introduction to research at a large scale facility (Ion Beam Center IBC) and opportunities for networking with HZDR specialists (f/m/d) on nanoscale surface modification and characterization.

-- completed B.Sc. studies or Vordiplom in experimental physics, materials science, or related subject
-- good command of German and/or English
-- ability to work independently and systematically

-- place of work: HZDR, location Rossendorf
-- project duration: 12 months, flexible starting time