Publications Repository - Helmholtz-Zentrum Dresden-Rossendorf

3 Publications
Cluster tool for in situ processing and comprehensive characterization of thin films at high temperatures
Wenisch, R.; Lungwitz, F.; Hanf, D.; Heller, R.; Zscharschuch, J.; Hübner, R.; von Borany, J.; Abrasonis, G.; Gemming, S.; Escobar Galindo, R.; Krause, M.;
A new cluster tool for in situ real-time processing and depth-resolved compositional, structural and optical characterization of thin films at temperatures from -100 to 800 °C is described. The implemented techniques comprise magnetron sputtering, ion irradiation, Rutherford backscattering spectrometry, Raman spectroscopy and spectroscopic ellipsometry. The capability of the cluster tool is demonstrated for a layer stack MgO/ amorphous Si (~60 nm)/ Ag (~30 nm), deposited at room temperature and crystallized with partial layer exchange by heating up to 650°C. Its initial and final composition, stacking order and structure were monitored in situ in real time and a reaction progress was defined as a function of time and temperature.
Keywords: Cluster tool, thin films, in situ, high temperature, Rutherford backscattering, Raman spectroscopy, ellipsometry, metal-induced crystallization
  • Open Access LogoAnalytical Chemistry 90(2018), 7837-7842
    DOI: 10.1021/acs.analchem.8b00923
  • Lecture (Conference)
    16th International Conference on Plasma Surface Engineering, 16.-21.09.2018, Garmisch - Partenkirchen, Deutschland
  • Lecture (Conference)
    XV Congreso Nacional de Materiales/ Iberian Meeting on Materials Science, 04.-06.07.2018, Salamanca, Spanien


Publ.-Id: 27732 - Permalink