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Ion Energy Distribution in Plasma Immersion Ion Implantation

Mändl, S.; Brutscher, J.; Günzel, R.; Möller, W.
In plasma immersion ion implantation the ions are accelerated
from the plasma to the target. The total current, as delivered by the high
voltage pulse generator, is only a qualitative reading of the ion flux
density on the target. The main reason for this is a large secondary electron
coefficient, strongly depending on the ion energy and the surface composition.
In this work direct time-resolved ion flux measurements are presented.
High voltage pulses of eU0 = 5, 10, 15 and 20 kV were applied to a spherical
target with a small orifice. The ions were collected in the high vacuum
region behind this orifice and their energy distribution function exhibits
a sharp peak at the nominal energy eU0 with the height decreasing during
the voltage pulse, in agreement with the theoretical predictions for a
collisionless transit through the plasma sheath.
  • Surface & Coatings Technology 93 (1997) 234-237
  • Lecture (Conference)
    3rd International Workshop on Plasma - Based Ion Implantation (PBII), Dresden, Germany, Sept. 16-18, 1996


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Publ.-Id: 693