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Fabrication of MSM detector structures on silicon by focused ion beam implantation

Teichert, J.; Bischoff, L.; Hausmann, S.
We report the fabrication of metal-semiconductor-metal
(MSM) photo detectors on silicon substrates with CoSi2 electrodes. The
electrode patterns have been formed by ion beam synthesis applying maskless
implantation with a cobalt focused ion beam. Implantation has been carried
out with the substrate at room temperature and at 400 °C.
  • Microelectronic Engineering 35 (1997) pp. 455.458

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Permalink: https://www.hzdr.de/publications/Publ-863
Publ.-Id: 863