Publications Repository - Helmholtz-Zentrum Dresden-Rossendorf

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Multimodal impurity redistribution and nanocluster formation in Ge implanted silicon dioxide films

von Borany, J.; Grötzschel, R.; Heinig, K.-H.; Markwitz, A.; Matz, W.; Schmidt, B.; Skorupa, W.
  • Applied Physics Letters 71 (22), 1 December 1997, p. 3215-3217

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Permalink: https://www.hzdr.de/publications/Publ-916
Publ.-Id: 916