Publications Repository - Helmholtz-Zentrum Dresden-Rossendorf

Nanopatterning solid surfaces by low-energy ion bombardment has received considerable interest in the recent years. This interest was partially motivated by promising applications of nanopatterned substrates in the production of functional surfaces. Especially nanoscale ripple patterns on Si surfaces have attracted attention both from a fundamental and an application related point of view. This paper summarizes the theoretical basics of ion-induced pattern formation and compares the predictions of the various continuum models to experimental observations with special emphasis on the morphology development of Si surfaces during sub-keV ion sputtering.