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Zr and Mo thin films with reduced residual impurities’ uptake under high vacuum conditions at room temperature
Meško, M.; Bohovičová, J.; Munnik, F.; Grenzer, J.; Hübner, R.; Čaplovič, Ľ.; Čaplovičová, M.; Vančo, Ľ.; Vretenár, V.; Krause, M.;
In recent years, transition (refractory) metals such molybdenum (Mo) and zirconium (Zr) have been studied as infrared (IR) reflector in solar absorber applications. The sputter process parameters are very important for depositing a high quality thin film achieving the necessary low emittance. IR reflectance of the metal film is influenced by the film microstructure, presence of residual impurities and surface roughness. The main objective of the present study is to prepare Mo and Zr metallic thin films with improved optical properties by high power impulse magnetron sputtering at room temperature under high vacuum conditions. In comparison to the Mo and Zr thin films deposited by direct current magnetron at the same average power, thin films deposited by HiPIMS exhibits dense microstructure without voids, grown preferentially along c-axis, have smooth surface and are free of residual contaminants. Compared to the dcMS films we observed an element specific reduction of impurities measured by elastic recoil detection analysis (ERDA) by a factor 4/8 for N, 3/4 for H and 9/14 for O for Mo/Zr thin films respectively. The compositional effects are correlated with differences in the film morphology microstructure revealed by scanning electron microscopy (SEM), X-ray diffraction (XRD) and transmission electron microscopy (TEM) analysis.
  • Poster
    16th International Conference on Plasma Surface Engineering, 16.-21.09.2018, Garmisch-Partenkirchen, Deutschland

Publ.-Id: 28695 - Permalink