Defects remaining in MeV-ion-implanted and armealed Si away from the peak of the nuclear energy deposition profile
Defects remaining in MeV-ion-implanted and armealed Si away from the peak of the nuclear energy deposition profile
Kögler, R.; Yankov, R. A.; Posselt, M.; Danilin, A. B.; Skorupa, W.
- Nucl. Instr. Meth. B147 (1999) 96
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Publ.-Id: 3128
