Depth analysis of buried iron disilicide formation by Fe ion implantation into Si
Depth analysis of buried iron disilicide formation by Fe ion implantation into Si
Walterfang, M.; Kruijer, S.; Keune, W.; Dobler, M.; Reuther, H.
Depth analysis of buried iron disilicide formation by Fe ion implantation into Si was performed by DCEMS.
-
Poster
International Conference on the Applications of the Mössbauer Effect, Oxford, England, 2.-7. Sept. 2001
Permalink: https://www.hzdr.de/publications/Publ-4312
Publ.-Id: 4312
