Techniques for depth profiling of dopants in 4H-SiC
Techniques for depth profiling of dopants in 4H-SiC
Österman, J.; Hallen, A.; Anand, S.; Linnarson, M. K.; Andersson, H.; Aberg, D.; Panknin, D.; Skorupa, W.
no abstract
- Materials Science Forum 353-356 (2001) 559
Permalink: https://www.hzdr.de/publications/Publ-5037
Publ.-Id: 5037
