In-situ XRD during sputtering deposition of Ni-Ti Shape Memory Alloys on TiN/SiO2/Si(100)

In-situ XRD during sputtering deposition of Ni-Ti Shape Memory Alloys on TiN/SiO2/Si(100)

Martins, R. M. S.; Schell, N.; Beckers, M.; Silva, R. J. C.; Mahesh, K. K.; Braz Fernandes, F. M.

• Poster
  ESRF User's Meeting 2006, 07.-08.02.2006, Grenoble, France

Permalink: https://www.hzdr.de/publications/Publ-9119
Publ.-Id: 9119