Contact
Dr. Shavkat Akhmadaliev
Head Accelerator
c.akhmadaliev
hzdr.de
Phone: +49 351 260 3284
Equipment for Plasma-Based Ion Implantation (PBII)
At the moment there are 6 PBII tools available. The plasma generation is possible with gaseous, liquid or solid source feeds.
Tool |
Plasma generation |
Chamber |
Substrate size |
High voltage |
Standard gases |
Other species |
Application |
|
RF antenna |
Stainless steel, UHV |
max. 70 mm x 7 0mm x 50 mm |
0.1 - 40 kV |
Ar, N2, O2, H2 |
on request |
Implantation |
|
|
RF antenna |
Stainless steel |
max. Ø 200 mm x 200 mm |
0.1 - 40 kV |
Ar, N2, O2, H2 |
Cr, Cu, Ni, Ti, Ta, Ag, C, others on request |
Implantation and deposition |
|
|
PBII-6 |
Magnetron |
Stainless steel |
max. Ø 75 mm x 20 mm |
0.1 - 12 kV |
Ar, N2, O2, H2 |
on request |
Implantation |
|
RF antenna |
Stainless steel, Al liner |
max. Ø 150 mm x 150 mm |
0.1 - 40 kV |
Ar, N2, CH2F2, SiF4 |
no |
Implantation of F |
|
|
RF antenna |
Stainless steel |
max. 200 mm x 200 mm x 200 mm |
0.1 - 20 kV |
Ar, N2, O2, H2 |
on request |
Implantation and deposition |
|
|
RF antenna |
Aluminium |
max. Ø 300 mm x 10 mm |
0.1 - 20 kV |
Ar, N2, H2, PH3, NF3 |
no |
Doping of semiconductors |
