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Title
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Controlled generation of single-photon emitters.
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Description
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Controlled generation of single-photon emitters in silicon (red) by broad-beam implantation of ions (blue) through a lithographically defined mask (left) and by a scanned focused ion beam (right).
Symbolically shown: the emission of two single photons at locations defined for this purpose by the process. In the background: An electron beam creates holes in the lithographic mask made of acrylate.
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Copyright
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M. Hollenbach, B. Schröder/HZDR
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Picture Id
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68336
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Date
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22.02.2023
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