The Clean Room Laboratory

The Institute of Ion Beam Physics and Materials Research provides for a Clean Room facility of in all 320 m2, including 4 offices. The aim of this facility is to supply a good research environment for the institute to produce semiconductor samples, thin layers and device test structures for ion beam and materials research.

The Clean Room facility itself, which came into use in August 1998, is a three-storey building, a second floor for the airconditioning, the ground floor where the laboratory rooms are suitated, and a underground floor with the media equipment and piping and tubing. The laboratory offers 118 m2 of class 500.000 rooms with measuring and test equipment, 136 m2 class 100.000 service areas, 35 m2 of class 1000 operator areas and 35 m2 working spots of class 100, warranting a good basis for semicondoctor technologies.




The laboratory is divided into 5 sections:

  • Standard wet chemical processing
  • Photolithography
  • Oxydation, diffusion, annealing
  • Physical thin film deposition & Reactive Ion Etching
  • Nonstandard wet chemical etching