Contact

PD Dr. habil. Artur Erbe
Abteilungsleiter
Scaling Phenomena
a.erbeAthzdr.de
Phone: +49 351 260 - 2366

Dr. Yordan Georgiev
Head of Nanofabrication
Transport Phenomena in Nanostructures
y.georgiev@hzdr.de
Phone: +49 351 260 - 2321

Equipment: Transport phenomena in nanostructures

Planned experimental setups

  Details

RAITH 150 

Electron beam writer RAITH 150-two (SEM/EBL)

  • 30 kV field emission cathode
  • Sample holder for wafers and small samples
  • Application: Electron beam lithography
    • up to 6 inch substrates
    • Smallest feature sizes 7 nm

Responsible: Y. Georgiev, Y.Georgiev@hzdr.de, 0351 / 260 - 2321

RAITH eLINE (picture will come soon)

Electron beam writer RAITH eLINE Plus (SEM/EBL)

  • details under work
  • ...
  • ...
    • up to ?? substrates
    • Smallest feature sizes ?? nm

Responsible: Y. Georgiev, Y.Georgiev@hzdr.de, 0351 / 260 - 2321

RIBE IonSys 500

Reactive Ion Beam Etcher Roth & Rau IonSys 500 (RIBE)

  • Ar source
  • Etch gas: CF4
  • Application: Anisotropic Etching
    • Metals
    • Up to 4 inch wafers

Responsible: A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366

Cryogenic Probe Station 

Cryogenic Probe Station

  • Lake Shore CPX-VF
    • Temperature range 4.5K – 400 K
    • Horizontal magnetic field up to 2T
  • Electrical characterization
    • 4-point geometry
    • semiconductor parameter analyzer

Responsible: A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366

Cryogenic UHV break junction setup

Cryogenic UHV break junction setup

  • Low-temperature MCBJs
    • C60 evaporator
    • UHV
    • Temperature range 4K – 400 K
  • Electrical characterization
    • MCBJ
    • C60

Responsible: A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366

 

Mechanically controllable break junctions (MCBJ)

  • Room temperature
  • Liquid environment
  • Application
    • Electrical characterization of molecular structures in liquid environment

Responsible: A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366

BETty

BETty

  • UHV evaporation tool
    • Base pressure <10-9 mbar
    • E-gun evaporator (7 pockets)
    • Thermal evaporator (Al)
    • Temperature range 130 K – 600 K
    • Tilt range ±45°
    • Sputter gun (sample cleaning)
  • Application: Metal film deposition

Responsible: Y. Georgiev, Y.Georgiev@hzdr.de, 0351 / 260 - 2321

Optical Tweezers

Optical Tweezers

  • tool for ...
    • ...
  • Application: ...

Responsible: ...

Planned experimental setups

 

Cluster deposition and characterization setup

  • Cluster source
    • Deposition of MoS clusters
    • Mass separation
    • Electrical characterization using MCBJ
  • Application
    • Electrical characterization of mass-selected MoS clusters using mechanically controllable break junctions (MCBJs)

Responsible: A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366

ASOPS

Asynchronous Optical Sampling (ASOPS)

  • Application
    • Optical characterization of nanomechanical resonators

Responsible: A. Erbe, a.erbe@hzdr.de, 0351 / 260 - 2366

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Contact

PD Dr. habil. Artur Erbe
Abteilungsleiter
Scaling Phenomena
a.erbeAthzdr.de
Phone: +49 351 260 - 2366

Dr. Yordan Georgiev
Head of Nanofabrication
Transport Phenomena in Nanostructures
y.georgiev@hzdr.de
Phone: +49 351 260 - 2321