Contact

Coordinator
PD Dr. Peter Zahn

Phone: +49 351 260 3121
E-mail: nanonet@hzdr.de

Spokesperson
Prof. Dr. Artur Erbe

Phone: +49 351 260 2366
E-mail: a.erbe@hzdr.de

News

2026-01-01
The excellence cluster REC2 Responsible Electronics in the Climate Change Era started with TUD as leading university - Congratulations.

2025-12-03
Lokamani has defended his PhD thesis at the faculty of electrical engineering of TU Dresden - Congratulations.

2024-11-22
The new SFB-Transregio 404 “Next Generation Electronics With Active Devices in Three Dimensions [Active-3D]” was granted by DFG (spokesperson Thomas Mikolajick). Web-site, Pressemitteilung TUD .

2020-12-31
Helmholtz funding of NanoNet expired, but the network will continously promote collaboration and exchange of ideas.
Thanks to all members and partners.
Stay in contact!

Events

2026-06-23/28
NT 26 - Science + Applications of Nanotubes and Low-Dim Materials, FU Berlin, DE

2026-09-07/11
Flatlands beyond Graphene 2026, Dresden, DE

2026-09-16/18
NanoNet+13 Workshop 2026, Topic tba., Schöneck near Plauen/Vogtland, DE
co-organized by Artur Erbe (HZDR) and others

2027-03-14/19
DPG Spring Meeting 2027 , Section Condensed Matter, Regensburg, DE

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Dresden Nano Seminar (TUD)

Ascent+ European Nanoelectronics Network

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Acknowledgment

IHRS NanoNet was funded by the Initiative and Networking Fund of Helmholtz Association (VH-KO-606) until Dec 2020.

From Self-Assembled Monolayers to Polymer Brushes

Lecturer:

Prof. Dr. Rainer Jordan & Dr. Ihsan Amin

Course Type:

Block Course, ca. 10 h

Start Date:

17-19 February 2014

Schedule:

Daily; 13:00-14:30, 15:00-16:30 

Location:

TU Dresden, HEM/219 (Walther-Hempel-Bau, Mommsenstr. 4, Room 219)

Summary:

This course covers the preparation of ultra-thin films on solids (Langmuir-Blodgett films, self-assembled monolayers, polymer brushes), characterization techniques (ellipsometry, wetting experiments, FTIR spectroscopy (ATR, ER), scanning probe microscopy) and 2D structuring (microcontact printing, SPM patterning, litographic patterning, chemical lithography).

Language:

English

More info:

Detailed content of the course

Notes:

The IHRS NanoNet cordially invites all interested to attend the course. 
Attendance is free, but due to the limited number of seats registration is required until 09 February 2014.

Registration: Registrations closed.