Implantation of halogens to improve TiAl-components for high temperature applications,


Implantation of halogens to improve TiAl-components for high temperature applications,

Donchev, A.; Kolitsch, A.; Möller, W.; Schütze, M.; Yankov, R.

No abstract available.

Keywords: TiAl alloys; halogen effect; oxidation resistance

  • Lecture (others)
    2nd Meeting of the International Advisory Committee of the Ion Beam Centre at FZD, 01.10.2007, Dresden, Germany

Permalink: https://www.hzdr.de/publications/Publ-10728
Publ.-Id: 10728