Implantation of halogens to improve TiAl-components for high temperature applications,
Implantation of halogens to improve TiAl-components for high temperature applications,
Donchev, A.; Kolitsch, A.; Möller, W.; Schütze, M.; Yankov, R.
No abstract available.
Keywords: TiAl alloys; halogen effect; oxidation resistance
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Lecture (others)
2nd Meeting of the International Advisory Committee of the Ion Beam Centre at FZD, 01.10.2007, Dresden, Germany
Permalink: https://www.hzdr.de/publications/Publ-10728
Publ.-Id: 10728