Ion-induced nanopatterns on silicon: experiment, theory, and application


Ion-induced nanopatterns on silicon: experiment, theory, and application

Keller, A.; Facsko, S.; Möller, W.

It is well known that oblique low and medium energy (typically 0.1 – 100 keV) ion erosion of solid surfaces can lead to the formation of periodic ripple patterns with wavelengths ranging from 10 to 1000 nm. The ripples produced in this way are oriented either parallel or normal to the projection of the ion beam and their wavelength scales with ion energy. These structures have been found on a large variety of materials, such as semiconductors, metals, and insulating surfaces. The formation and early evolution of the ripple patterns can be qualitatively reproduced by a linear continuum equation derived by Bradley and Harper. At longer times, however, nonlinear terms have to be taken into account, leading to nonlinear models based on the Kuramoto-Sivashinsky equation.
In this talk, recent experimental results on the evolution of ripple morphologies on Si(100) surfaces during high-fluence ion sputtering will be presented and compared to numerical integrations of the damped Kuramoto-Sivashinsky equation. In addition, promising applications of nanorippled substrates as templates in thin film growth will be discussed.

  • Lecture (others)
    Seminar, 15.02.2008, Madrid, Spain
  • Lecture (others)
    Seminar, 27.02.2008, Madrid, Spain

Permalink: https://www.hzdr.de/publications/Publ-11091
Publ.-Id: 11091