Comparison of the structural developments in the C:Ni films grown by ion beam sputtering and pulsed filtered cathodic vacuum arc


Comparison of the structural developments in the C:Ni films grown by ion beam sputtering and pulsed filtered cathodic vacuum arc

Abrasonis, G.; Kovacs, G. J.; Ryves, L.; Mücklich, A.; Krause, M.; Munnik, F.; Oates, T. W. H.; Bilek, M. M. M.; Kolitsch, A.; Möller, V.

he structure of C:Ni nanocomposite thin films grown by ion beam sputtering (IBS) and pulsed filtered cathodic vacuum arc (PFCVA) is compared. The films were grown in the temperature (T) and Ni concentration ranges of RT-500C and 7-40 at.%, respectively. The composition of the films and elemental depth profiles were determined by elastic recoil detection analysis (ERDA). The morphology and phase composition were investigated by transmission electron microscopy and x-ray diffraction, respectively. Independent of the growth method the Ni dispersed phase is carbidic for T<=300C and mostly fcc metallic at higher deposition temperatures. In the C:Ni films grown by IBS the transition from globular towards columnar growth occurs at 200

  • Lecture (Conference)
    E-MRS 2009 Spring Meeting,, 08.-12.06.2009, Strasbourg, France

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Publ.-Id: 12878