Application of Focused Ion and Electron Beams in Materials Research


Application of Focused Ion and Electron Beams in Materials Research

Bischoff, L.

At the beginning the lecture I will briefly give an overview about the organization of the Research Centre Dresden-Rossendorf with different Institutes and research topics. In the Institute of Ion Beam Physics and Materials Research the application of ion beams in advanced materials science is manifold: for example, they are used to generate new or improved functional surfaces, and they are ideally suited to produce micro- and nanostructures in semiconductors. For these purposes in the Institute a couple of modern ion beam instruments for the fabrication and analysis of nanostructures is available. Among them there are a mass separated focused ion beam (FIB) and a crossbeam system, consisting of a high resolution Ga-FIB and a scanning electron microscope (SEM), which will be discussed more in detail. During the last decades, focused ion beams became a very useful and versatile tool in microelectronics industry, as well as in the field of basic and applied research and became an indispensable tool in nanotechnology. For special purposes like ion milling, ion beam writing for doping or patterning on μm- and nm-scale without any lithographic steps Ga+ and increasingly other ion species are of great interest. An introduction in design and operation of mass separated FIB systems (e.g. CANION31Mplus), equipped with metal alloy liquid ion sources as well as the development and characterization of them will be given. The combination of a focused electron beam with a high resolution FIB column in a crossbeam arrangement (NVision40) enables the in-situ inspection and analysis of FIB fabricated nanostructures with a resolution down to one nm without surface damaging. An included gas injection system allows the MO-CVD of nanostructures of different materials using either the focused ion or the electron beam. The fabrication possibilities of nanostructures, like nanowires, nanobridges and nanocantilevers by ion beam synthesis using different kinds of focused ion beams will be demonstrated and possible applications will be mentioned. Some examples, like ion beam synthesis of CoSi2 nano-structures, the generation of fluorescent colour centres, sputtering investigations and applications, the formation of ripples under FIB irradiation or the fabrication of NEMS structures on SOI substrates will be shown to demonstrate the manifold utilization of the microbeam technology. Furthermore, the possibility of varying the flux in the FIB by changing the pixel dwell-time in a wide range gives the opportunity to investigate radiation damage and dynamic annealing effects in Si, Ge, SiC and other materials at elevated implantation temperatures using different projectile ion species. Finally, the state-of art of FIB applications for TEM lamella preparation, FIB lithography of thin films and ion beam microscopy will be presented and shortly discussed.

Keywords: Focused Ion Beam; Liquid Metal Ion Source; Electron Microscopy; Nanotechnology

  • Invited lecture (Conferences)
    imdea nanociencia, 04.11.2009, Madrid, Spanien
  • Invited lecture (Conferences)
    Kolloquiumsvortrag, 10.12.2009, Leipzig, Deutschland

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Publ.-Id: 13299