Compositional, structural and morphological modifications of N-rich Cu₃N films induced by irradiation with Cu⁸⁺ at 42 MeV

N-rich Cu₃N films were irradiated with Cu⁸⁺ at 42 MeV in the fluence range from 4×10¹¹ to 1×10¹⁴ cm^-2. The radiation-induced changes in the chemical composition, structural phases, surface morphology and optical properties have been characterised as a function of fluence, substrate temperature and angle of incidence of the incoming ion by means of ion beam analysis (IBA), X-ray diffraction (XRD), atomic force microscopy (AFM), profilometry and Fourier transform IR spectrophotometry (IRFT). IBA techniques reveal a very efficient sputtering of N whose yield (5×10³ at/ion) is almost independent of substrate temperature (RT-300ºC) but slightly depends on the incidence angle of the incoming ion. The area density of Cu remains essentially constant within the investigated fluence range. All data suggest an electronic mechanism to be responsible for the N depletion. The release of nitrogen and the formation of Cu₂O and metallic Cu are discussed on the basis of existing models.