Reactive High Impulse Power Magnetron Sputtering of Ti in Ar/O2 atmosphere


Reactive High Impulse Power Magnetron Sputtering of Ti in Ar/O2 atmosphere

Audronis, M.; Abrasonis, G.; Heller, R.; Chapon, P.; Bellido-Gonzalez, V.

High Power Impulse Magnetron Sputtering (HIPIMS) is a technologically important Physical Vapour Deposition (PVD) process that is able to provide a highly ionised flux of sputtered species. It is thought to be particularly important for applications where there is a need to coat 3D features. HIPIMS may have other added benefits, as compared to DC or medium frequency (MF) magnetron sputtering, that are related to improved coating structure-property relationship control through self-species ion/plasma assistance. Enhanced structure and properties of PVD thin film materials produced by reactive sputtering are also highly desirable. Significant progress related to providing control means for reactive HIPIMS processes and ensuring stability has been made recently. This paper reports some of the recent process (reactive HIPIMS of Ti in Ar/O2 atmosphere) and products analysis results. The recently developed Plasma Monitoring based method was used to investigate, monitor and control the deposition process. RBS, ERDA, GDOES and Spectroscopic Ellipsometry were used to characterise the samples produced.

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  • Lecture (Conference)
    HIPIMS 2011 - 2nd International Conference on HIPIMS, 28.-29.06.2011, Braunschweig, Germany

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Publ.-Id: 16903