Mechanical and ellipsometry measurements of thin TiN layer prepared by PIII


Mechanical and ellipsometry measurements of thin TiN layer prepared by PIII

Abd El-Rahman, A. M.; Raaif, M.; Mohamed, S.; Kolitsch, A.

Titanium nitrides have good mechanical, biomedical and optical properties, therefore they are used to harden and protect cutting and sliding surfaces and as a non-toxic exterior for bio-medical applications. Nitrogen plasma immersion implantation (Pill), in which the diffusion of nitrogen from low pressure r.f. plasma is combined with the implantation of nitrogen ions at energies up to 30 kV, is an effective tool for nitriding titanium and titanium alloys. In this work, samples of pure titanium were nitrided by Pill at different negative high voltage pulses. The properties and the characteristics of the processed samples were evaluated using X-ray diffraction (XRD), Auger electron spectroscopy (AES), ball-on-disk type tribometer, surface profilemeter, and ellipsometry measurements. The results show that, the wear resistance of the untreated sample in comparison to the PIII treated samples is extremely poor and the friction coefficient for the PIII treated samples is decrease!
d to the half value in comparison to the untreated titanium, this attributed to the formation of the solid solution titanium alpha-Ti(N) and the cubic TiN phases. Ellipsometric measurements were carried out on the PIII treated samples at different negative high voltage pulses. A three layers model was used to fit the calculated data to the experimental ellipsometric spectra. The thickness, surface roughness and refractive index increase with increasing the negative high voltage pulses. The refractive index at 550 nm increases from 1.83 to 2.09 as the negative high voltage pulses increases from 10 to 30 kV.

Keywords: PIII; TiN; ellipsometry

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Publ.-Id: 16950