Inhibition of the Oxidation of Intermetallic TiAl by Ion Implantation


Inhibition of the Oxidation of Intermetallic TiAl by Ion Implantation

Hornauer, U.; Günzel, R.; Reuther, H.; Richter, E.; Wieser, E.; Möller, W.

The effect of ion beam implantation and plasma immersion ion implantation of chlorine on the high temperature oxidation of titanium aluminides above 800 °C in air was investigated. Thermogravimetric oxidation tests (TGA) were performed to examine the long term protection. Depth profiling with Auger electron spectroscopy (AES) was used to investigate Cl diffusion and oxide formation during the first stage of oxidation. A microscopic model of the chlorine effect will be discussed. A systematic variation of the implantation energy and fluence shows that there is a narrow regime of the Cl concentration for optimum protective effect at 900°C in air. The oxidation rate after this incubation time is reduced by about 2 orders of magnitude compared to untreated Ti50Al and is nearly independent of the fluence. The effect is almost independent of the implantation energy in the range of 15 keV to 1 MeV. First results of plasma immersion ion implantation of chlorine show that it is possible to use this technique to implant also large and complex surfaces.

Keywords: Implantation; TiAl; Intermetallics; Oxidation; high temperature oxidation; Plasma immersion ion implantation; PSI

  • Lecture (Conference)
    8th Week of Doctoral Students (WDS), Charles University, Prag 1999, 24.06.1999

Permalink: https://www.hzdr.de/publications/Publ-2050
Publ.-Id: 2050