A lithium liquid metal ion source with narrow angle emission for writing beam lithography


A lithium liquid metal ion source with narrow angle emission for writing beam lithography

Hesse, E.; Naehring, F. K.; Teichert, J.

Parameters of a lithium liquid metal ion source have been determined. The angular intensity is the higest yet reported for liquid metal ion sources. This high angular intensity and the large range of light ions suggest the liquid metal ion source to be applied for writing beam lithography. PMMA resist layers were exposed by a focused lithium ion beam.

  • Microelectronic engineering 23 (1994) 111-114

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Publ.-Id: 2088