Comparison of Technologies for Nano Device Prototyping with a Special Focus on Ion Beams - A review


Comparison of Technologies for Nano Device Prototyping with a Special Focus on Ion Beams - A review

Bruchhaus, L.; Mazarov, P.; Bischoff, L.; Gierak, J.; Wieck, A. D.; Hövel, H.

Nano device prototyping (NDP) is essential for realizing and assessing ideas as well as theories in form of nano devices, before they can be made available in or as commercial products. In this review, application results patterned similarly as in the semiconductor industry (for cell phone, computer processors or memory) will be presented. For NDP some requirements are different, thus different technologies are employed. Currently, in NDP, for many applications direct write Gaussian vector scan electron beam lithography (EBL) is used to define the required features in organic resist on this scale.
We will take a look at many application results carried out by EBL, self-organized 3D epitaxy, atomic probe microscopy (STM / AFM) and in more detail ion beam techniques. For ion beam techniques there is a special focus on those based upon liquid metal (alloy) ion sources (LM(A)IS), as recent developments have significantly increased their applicability for NDP.

Keywords: nanotechnology; nano device protoyping; nano patterning; nano fabrication; focused ion beam; electron beam lithography; self-organized 3D epitaxy; atomic; scanning probe nano patterning; magnetics; photonics; fluidics; implantation

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Publ.-Id: 24275