TEM investigation of C-Si defects in Carbon-implanted Silicon


TEM investigation of C-Si defects in Carbon-implanted Silicon

Werner, P.; Kögler, R.; Eichler, D.; Skorupa, W.

  • Contribution to external collection
    Proc. 11th Int. Conf. Ion Implantation Technology; The Inst. of Electrical and Electronics Eng., Piscataway, USA, 1997, p. 675

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Publ.-Id: 2666