Non-classical Liquid Metal Ion Sources for advanced FIB nano-patterning

Focused Ion Beam (FIB) processing has been developed into a well-established and still promising technique for direct patterning and proto-typing on the nm scale. Exploring the Liquid Metal Alloy Ion Sources (LMAIS) potential represents a promising alternative to expand the global FIB application fields. Especially, Ion Beam Lithography (IBL) as direct, resistless and three-dimensional patterning enables a simultaneous in-situ process control by cross-sectioning and inspection. Thanks to this, nearly half of the elements of the periodic table are made available in the FIB technology as a result of continuous research in this area during the last forty years. Key features of a LMAIS are long life-time, high brightness and stable ion current. Recent developments could make these sources to an alternative technology feasible for nano-patterning challenges, e.g. to tune electrical, optical, magnetic or mechanical properties.

In this contribution the operation principle, the preparation and testing process as well as prospective domains for modern FIB applications will be presented. As an example we will introduce a Ga35Bi60Li5 LMAIS in detail. It enables high resolution imaging with light Li ions and sample modification with Ga or heavy polyatomic Bi clusters, all coming from one ion source.

L. Bischoff, P. Mazarov, L. Bruchhaus, and J. Gierak, Appl. Phys. Rev. 3, 021101 (2016).