Application of a DC glow discharge source with controlled plasma potential in plasma immersion ion implantation


Application of a DC glow discharge source with controlled plasma potential in plasma immersion ion implantation

Ueda, M.; Berni, L. A.; Gomes, G. F.; Beloto, A. F.; Abramof, E.; Reuther, H.

A DC glow discharge source with controlled plasma potential was developed for application in plasma immersion ion implantation processing of materials.

Keywords: Ion implantation; Auger electron spectroscopy

  • Journal of Applied Physics 86 (1999) 4821 - 4824

Permalink: https://www.hzdr.de/publications/Publ-3231
Publ.-Id: 3231