Application of a DC glow discharge source with controlled plasma potential in plasma immersion ion implantation
Application of a DC glow discharge source with controlled plasma potential in plasma immersion ion implantation
Ueda, M.; Berni, L. A.; Gomes, G. F.; Beloto, A. F.; Abramof, E.; Reuther, H.
A DC glow discharge source with controlled plasma potential was developed for application in plasma immersion ion implantation processing of materials.
Keywords: Ion implantation; Auger electron spectroscopy
- Journal of Applied Physics 86 (1999) 4821 - 4824
Permalink: https://www.hzdr.de/publications/Publ-3231
Publ.-Id: 3231