The application of high energy ion implantation for silicon radiation detectors
The application of high energy ion implantation for silicon radiation detectors
von Borany, J.; Schmidt, B.; Grötzschel, R.
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Nuclear Instruments and Methods in Physics Research A 377 (1996) pp. 514-520
DOI: 10.1016/0168-9002(96)00235-5
Cited 26 times in Scopus -
Lecture (Conference)
oral presentation during, 7th European Symposium on Semiconductor Detectors, Schloß Elmau, 7.-10.5.1995
Permalink: https://www.hzdr.de/publications/Publ-353
Publ.-Id: 353