The application of high energy ion implantation for silicon radiation detectors


The application of high energy ion implantation for silicon radiation detectors

von Borany, J.; Schmidt, B.; Grötzschel, R.

  • Nuclear Instruments and Methods in Physics Research A 377 (1996) pp. 514-520
    DOI: 10.1016/0168-9002(96)00235-5
    Cited 26 times in Scopus
  • Lecture (Conference)
    oral presentation during, 7th European Symposium on Semiconductor Detectors, Schloß Elmau, 7.-10.5.1995

Permalink: https://www.hzdr.de/publications/Publ-353
Publ.-Id: 353