Application of indium ion implantation for halo doping: experimental and simulation results for advanced CMOS devices


Application of indium ion implantation for halo doping: experimental and simulation results for advanced CMOS devices

Variam, N.; Jeong, U.; Falk, S.; Mehta, S.; Posselt, M.; Feudel, T.; Horstmann, M.; Krüger, C.; Ng, C.-H.

Informations can be requested. Email: M.Posselt@fz-rossendorf.de

  • Lecture (Conference)
    13th International Conference on Ion Implantation Technology, Alpbach, Austria, September 17-22, 2000
  • Contribution to external collection
    Proc. 2000 Int. Conf. on Ion Implantation Technology, Alpbach, Austria, September 17 -22, eds.: H. Ryssel, L. Frey, J. Gyulai, H. Glawischnig, IEEE, Piscataway, USA, 2000, IEEE Publications 00EX432, p. 42

Permalink: https://www.hzdr.de/publications/Publ-3530
Publ.-Id: 3530