High quality screen-printed and fired-through silicon nitride rear contacts for bifacial silicon solar cells


High quality screen-printed and fired-through silicon nitride rear contacts for bifacial silicon solar cells

Lenkeit, B.; Steckemetz, S.; Mücklich, A.; Metz, A.; Hezel, R.

A simple industrially feasible screen printing process for bifacial silicon (Si) solar cells has been developed. The process sequence is based on co-firing of front and rear contacts through surface-passivating remote plasma-enhanced chemical vapour deposited (RPECVD) silicon nitride (SiN) antireflection coatings. Due to the thermal stability of the RPECVD silicon nitride films the firing step results in an excellent front and rear surface passivation which is comparable to a high-efficiency process with vacuum-evaporated metal contacts. The proposed rear surface design is also well-suited for the improvement of the front efficiency of screen-printed monofacial Si solar cells presently produced by the photovoltaic industry. Special attention is paid to the optimisation of the rear efficiency as well as to the understanding of the mechanism of contact formation in the firing-through-SiN process.

Keywords: c-Si - 1: Bifacial - 2: Screen Printing - 3

  • Lecture (Conference)
    Proc. 16th European Photovoltaic Solar Energy Conference, Glasgow, United Kingdom, 1 - 5 May 2000
  • Contribution to proceedings
    Proc. 16th European Photovoltaic Solar Energy Conference, Glasgow, United Kingdom, 1 - 5 May 2000

Permalink: https://www.hzdr.de/publications/Publ-3556
Publ.-Id: 3556