Studies of carbon ion self-implantation into hydrogenated amorphous carbon films
Studies of carbon ion self-implantation into hydrogenated amorphous carbon films
Khan, R. U. A.; Grambole, D.; Silva, S. R. P.
The properties of polymer-like amorphous hydrogenated carbon thin films with low defect density have been studied. These films were implanted with carbon ions with a dose range of 1012 - 1016 cm-2. The purpose of the study is to investigate the effects of ion beam damage on this type of film. Optical absorption measurements observe a narrowing of the optical band gap, suggesting the introduction of a large number of defect states subsequent to the implantation resulting in the broadening of the band tails, only after a threshold ion dose of 1015 cm-2. Nuclear reaction analysis suggests also a reduction in the hydrogen content of the film which coincides with film thinning.
Keywords: Amorphous carbon; Defect; Hydrogen; Ion implantation
- Diamand and Related Materials 9 (2000) 657 - 679
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